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Equipment database NanoLabNL

Are you looking for a specific tool for lithography, thermal processing or deposition? Or do you already have a specific tool in mind and looking for a Nano Lab NL-location where you can find that tool?

Please use our equipment database to find what you are looking for. Search by:

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id Tool name Location Process Sub-process Function Specimen
1 Delta 80 AMOLF NanoLab Amsterdam Lithography Spin coating Spincoater up to wafer 100 mm
2 Diamond Scriber Philips Innovation Services Miscellaneous Scribing/dicing Max. 8 inch diameter
3 Diamond tool scribing NanoLab@TU/e Eindhoven Miscellaneous Scribing/dicing Accurate positioning of scribe lines. Maximum size of 3 inch InP/GaAs wafers
4 Dicing Saw AMOLF NanoLab Amsterdam Miscellaneous Scribing/dicing Machining of semiconductor or dielectric wafer substrates. up to wafer 100 mm
5 Dicing saw Disco MESA+ NanoLab Twente Miscellaneous Scribing/dicing Dicing wafers Single wafer 100 mm
6 Dicing saw Loadpoint MESA+ NanoLab Twente Miscellaneous Scribing/dicing Dicing wafers Single wafer 100 mm
7 Dillfridge Leiden Cryogenics MCK76-400 Zernike Nanolab Groningen Sample cooling Cooling down of sample to a temperature of about 15mK Max. 12 x 12 mm
8 Disco Dicer Kavli Nanolab Delft Miscellaneous Scribing/dicing Machining of semiconductor, metal or dielectric wafer shape substrates. Max. 4 inch (100 mm) wafer, small pieces allowed.
9 Disco_DAD321 EKL Nanolab Delft packaging saw
10 Down stream plasma stripper Philips Innovation Services Etching Strippers 6 and 8 inch diameter
11 DRIE Adixen DE MESA+ NanoLab Twente Etching DRIE systems Oxide etching 100 mm substrates
12 DRIE Adixen SE MESA+ NanoLab Twente Etching DRIE systems Silicon etching 100 mm substrates
13 DRIE Oxford 100 (Catharina) MESA+ NanoLab Twente Etching DRIE systems Si (O,N) Etching 100 mm substrates
14 Drytek_Triode_384T EKL Nanolab Delft etching RIE systems
15 Dual Beam: Focused Ion Beam / Scanning Electron Microscope Kavli Nanolab Delft Ion beam technology Dual beam Pattering and fabricating structures at the nano- or microscale with the FIBand analyze them with the SEM. Max. 4 inch in diameter Max. 10 mm thickness
16 Dual-FIB FEI Instruments MESA+ NanoLab Twente Ion beam technology Dual beam Focus Ion Beam of Small samples up to 100 mm
17 Dust inspection lamp MESA+ NanoLab Twente Inspection / Metrology Optical Microscopy Surface inspection Small samples up to 100 mm
18 E-beam lithography Raith MESA+ NanoLab Twente Lithography E-beam E-beam lithography system Single wafer 100 mm
19 E-beam lithography SSE-ST 22+ MESA+ NanoLab Twente Lithography Spin coating Resist spinner tool Single wafer 100 mm
20 E-line Zernike Nanolab Groningen Lithography E-beam Lithography

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