Equipment database

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Equipment database NanoLabNL

Are you looking for a specific tool for lithography, thermal processing or deposition? Or do you already have a specific tool in mind and looking for a Nano Lab NL-location where you can find that tool?

Please use our equipment database to find what you are looking for. Search by:

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Location
Process
Sub-process
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Main characteristics
 
id Tool name Location Process Sub-process Function Specimen
1 Axioskop AMOLF NanoLab Amsterdam Inspection / Metrology Sample characterization up to wafer 100 mm
2 BAK 550 (2x) Philips Innovation Services Film formation Evaporation Max. 8 inch diameter
3 BAK 640 Philips Innovation Services Film formation Evaporation Max. 8 inch diameter
4 Barrel Etcher NanoLab@TU/e Eindhoven Etching Strippers Stripping of polymers. Maximum wafer size 2-inch
5 Binder resist bake oven Kavli Nanolab Delft Lithography Baking Baking
6 BJD-1800 Zernike Nanolab Groningen Film formation Evaporation Coating Max 3 inch diameter
7 Bond inspection camera MESA+ NanoLab Twente Inspection / Metrology Optical Microscopy Surface inspection Small samples up to 100 mm
8 Bruker Profilometer Kavli Nanolab Delft Kavli Nanolab Delft Stylus Profilometer max 150mm wafers
9 Capacitance-Voltage (CV) profiler NanoLab@TU/e Eindhoven Inspection / Metrology Stylus Carrier Density Measurement Maximum size of 3 inch InP/GaAs wafers
10 Carbon Evaporator Polaron MESA+ NanoLab Twente Film formation Evaporation Evaporation of carbon Up to 100 mm
11 Ceramic Hotplates NanoLab@TU/e Eindhoven Lithography Baking Heating Maximum wafer size 3-inch
12 Cluster ovenstack Tempress MESA+ NanoLab Twente Thermal processing Tube furnace Deposition of thin layers 1-25 wafers per run (100mm)
13 Clustersystem (3 reactors) own design MESA+ NanoLab Twente Film formation ALD Atomic layer growth Single wafer 100 mm
14 CMP Cleaning station MESA+ NanoLab Twente Miscellaneous CMP Mechanical polishing Single wafer 100 mm
15 CMP Mixer MESA+ NanoLab Twente Miscellaneous CMP Mixing CMP solutions Single wafer 100 mm

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