Equipment database

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Equipment database NanoLabNL

Are you looking for a specific tool for lithography, thermal processing or deposition? Or do you already have a specific tool in mind and looking for a Nano Lab NL-location where you can find that tool?

Please use our equipment database to find what you are looking for. Search by:

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Tool name
Location
Process
Sub-process
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Main characteristics
 
id Tool name Location Process Sub-process Function Specimen
1 KJL sputtering tool Zernike Nanolab Groningen Film formation Sputtering Coating Max 3 inch diameter
2 KLA P16+ step height measurement Philips Innovation Services Inspection / Metrology Stylus Max. 8 inch diameter
3 KLA Surfscan 4500 Philips Innovation Services Miscellaneous Dust inspection Max. 6 inch diameter
4 Koyo furnace Philips Innovation Services Thermal processing Ovens Max. 8 inch diameter
5 L560 Evaporator Kavli Nanolab Delft Film formation Evaporation Thin film deposition Max. 4 inch wafer, small pieces allowed
6 LAM_Rainbow_RIE_etcher EKL Nanolab Delft etching RIE systems
7 Laser Interference lithography own design MESA+ NanoLab Twente Lithography Optical Single wafer 100 mm
8 Laurell_Spinner_SAL EKL Nanolab Delft lithography Spin coating
9 Leitz/Leica High Quality Research Microscope Kavli Nanolab Delft Inspection / Metrology Optical Microscopy Bright field, dark field, phase contrast, DIC, polarization, and fluorescence with all objectives Any size; max. thickness 80 nm
10 Leitz_MPV_SP EKL Nanolab Delft Inspection / Metrology
11 Lift-off system Philips Innovation Services Wet processing Cleaning Max. 8 inch diameter
12 Liquid_Silicon_Glove_Box EKL Nanolab Delft Miscellaneous
13 LLS 802 Philips Innovation Services Film formation Sputtering Max. 8 inch diameter
14 Logitech_Flatness_Measurement_System EKL Nanolab Delft Inspection / Metrology
15 LPCVD Tempress (F-stack) MESA+ NanoLab Twente Thermal processing Tube furnace Deposition of thin layers 1-25 wafers per run (100mm)
16 LPCVD Tempress (G-stack) MESA+ NanoLab Twente Thermal processing Tube furnace Deposition of thin layers 1-25 wafers per run (100mm)
17 LSM 710 ConfoCor 3, Zeiss Zernike Nanolab Groningen Confocal microccopy Imaging, FCS, FRAP Confocal imaging, FCS and DCFBA Fluorescently labeled material
18 Ma BA6 AMOLF NanoLab Amsterdam Lithography Optical Alignment and exposure
19 Magnetron Sputtering System NanoLab@TU/e Eindhoven Film formation Sputtering Magnetron Sputtering System. Maximum wafer size 4-inch
20 Magnetron Veeco Philips Innovation Services Film formation Sputtering 2 cm max

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