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Equipment database NanoLabNL

Are you looking for a specific tool for lithography, thermal processing or deposition? Or do you already have a specific tool in mind and looking for a Nano Lab NL-location where you can find that tool?

Please use our equipment database to find what you are looking for. Search by:

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id Tool name Location Process Sub-process Function Specimen
1 Anisotropic silicon etching Philips Innovation Services Wet processing Inorganic processes Max. 8 inch diameter
2 Anodic bonder EVG MESA+ NanoLab Twente Miscellaneous Anodic bonding Bonding wafers Double wafer 100 mm
3 ASML Scanner NanoLab@TU/e Eindhoven Lithography Optical Exposure of ArF DUV Resist 8-inch wafer compatible, 3-inch wafer compatibility conversion pending
4 ASML Stepper PAS5500/100 Philips Innovation Services Lithography Optical Max. 8 inch diameter
5 Atomic Force Microscope Kavli Nanolab Delft Inspection / Metrology AFM Step height measurement, roughness measurement Scanning Tunneling Microscopy (STM), Lateral Force Microscopy (LFM), Magnetic Force Microscopy (MFM, Electric Force Microscopy (EFM), Scanning Capacitance Microscopy (SCM) and Nanolithography / NanoManipulati Max. 8 inch wafer, small pieces allowed, max. thickness 2 cm.
6 Atomic Force Microscopy MESA+ NanoLab Twente Characterisation AFM Surface structure measurement Up to 100 mm
7 Atomic Force Microscopy (AFM), Bioscope Catalyst NanoLab@TU/e Eindhoven Inspection / Metrology AFM Topographic imaging and force profiling of biological samples Flat samples; size of microscope slide or cover slip.
8 Atomic layer deposition MESA+ NanoLab Twente Film formation Sputtering Deposition of very thin layers Up to 100 mm
9 Atomic Layer Deposition (ALD), FlexAL MK1 NanoLab@TU/e Eindhoven Film formation ALD Deposition of ultra thin layers Wafer(like) and other substrates with a maximum diameter of 8 inch
10 Atomic Layer Deposition (ALD), FlexAL MK2 NanoLab@TU/e Eindhoven Film formation ALD Deposition of ultra thin layers Wafer(like) and other substrates with a maximum diameter of 8 inch
11 Atomic Layer Deposition (ALD), OpAL NanoLab@TU/e Eindhoven Film formation ALD Deposition of ultra thin layers Wafer(like) and other substrates with a maximum diameter of 8 inch
12 Atomic Layer Deposition System Kavli Nanolab Delft Film formation ALD Deposition of very thin, extremely uniform layers. Max. 4 inch (100 mm) wafer, small pieces allowed.
13 ATV Annealfurnace Philips Innovation Services Thermal processing Ovens Max. 8 inch diameter
14 Au/Ag Thermal Evaporator NanoLab@TU/e Eindhoven Film formation Evaporation Deposition of thin metal films. Maximum wafer size 2-inch
15 Avanti 472 Philips Innovation Services Miscellaneous CMP Max. 8 inch diameter
16 AxioObserver, inverted microscope Zernike Nanolab Groningen Wide-field LED microscopy Live cell imaging Time-lapse imaging Fluorescently labeled material

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