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Equipment database NanoLabNL

Are you looking for a specific tool for lithography, thermal processing or deposition? Or do you already have a specific tool in mind and looking for a Nano Lab NL-location where you can find that tool?

Please use our equipment database to find what you are looking for. Search by:

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id Tool name Location Process Sub-process Function Specimen
1 General wet-benches NanoLab@TU/e Eindhoven Wet processing Choose a subprocess… Wet-chemical etching of semiconductors / metals ; Electroplating of Gold(Pulse-plating in a RDE-potentiostatic set-up). Maximum wafer size 3 inch.
2 Glove box Braun MESA+ NanoLab Twente Miscellaneous Glove box Preparing substrates under N2 flow Small samples up to 100 mm
3 Gold sputtercoater SEM Emitech MESA+ NanoLab Twente Film formation Sputtering Sputtering of gold layer Up to 100 mm
4 Gold sputtercoater SEM Polaron MESA+ NanoLab Twente Film formation Sputtering Sputtering of gold layer Up to 100 mm
5 Gyrset RC 8 MESA+ NanoLab Twente Lithography Spin coating Resist spinner tool Single wafer 100 mm
6 Handy Smurf AMOLF NanoLab Amsterdam Evaporation general purpose evaporation up to wafer 100 mm
7 Hereaus_Vacuum_Oven_MEMS EKL Nanolab Delft miscellaneous
8 HF vapour etch VPE200 Philips Innovation Services Wet processing Inorganic processes Max. 8 inch diameter
9 HF vapour Idonus MESA+ NanoLab Twente Wet processing Inorganic processes Etching SiO2 in gas phase Single wafer 100 mm
10 HF_Vapor_Etcher_Primaxx_uEtch_HF_SPTS EKL Nanolab Delft wet processing Inorganic processes
11 High Resolution Mask Aligner NanoLab@TU/e Eindhoven Lithography Optical High Resolution Photolithography in a vacuum-contact mode Maximum wafer size 4-inch
12 Hitachi Ultra-high Resolution Scanning Electron Microscope S-4800 Kavli Nanolab Delft Inspection / Metrology SEM Specimen surface inspection / Ultra high resolution and ultra low voltage imaging Max. 4 inch in diameter
13 HMDS vaporizing own design MESA+ NanoLab Twente Lithography Primering Priming substrates Small samples up to 100 mm
14 HMDS vaporizing own design MESA+ NanoLab Twente Lithography Primering Priming substrates Small samples up to 100 mm
15 HMDS-primer deposition NanoLab@TU/e Eindhoven Lithography Primering Improving fotoresist adhesion Maximum wafer size 3-inch
16 Horizontal Atmospheric furnace Philips Innovation Services Thermal processing Tube furnace Max. 8 inch diameter
17 Horizontal LPCVD furnace Philips Innovation Services Thermal processing Tube furnace Max. 8 inch diameter
18 Hot embossing Obducat MESA+ NanoLab Twente Lithography Imprint Hot embossing Single wafer 100 mm
19 HR-SEM - Zeiss 1550 MESA+ NanoLab Twente Inspection / Metrology SEM Surface topography and imaging High vacuum resistant specimen, in solid state, inorganic, organic. Specimen preparation sometimes required, for example EDS analysis requires carbon coating
20 HTS sputtercluster MESA+ NanoLab Twente Film formation Sputtering

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