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Equipment database NanoLabNL

Are you looking for a specific tool for lithography, thermal processing or deposition? Or do you already have a specific tool in mind and looking for a Nano Lab NL-location where you can find that tool?

Please use our equipment database to find what you are looking for. Search by:

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Process
Sub-process
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Main characteristics
 
id Tool name Location Process Sub-process Function Specimen
1 E-line TNO NanoLab Delft Lithography E-beam Lithography Max 4 inch diameter
2 E-line Zernike Nanolab Groningen Lithography E-beam Lithography
3 Eichorn_Wafer_Shape EKL Nanolab Delft Inspection / Metrology
4 Electroglass Automatic prober Philips Innovation Services Characterisation Electrical characterisation Max. 6 inch diameter
5 Electron Beam Evaporator, BVR2008FC NanoLab@TU/e Eindhoven Film formation Evaporation Deposition of thin metal films. Maximum wafer size 2 inch.
6 Electron Beam Evaporator, FC2000 NanoLab@TU/e Eindhoven Film formation Evaporation Deposition of thin metal films. Maximum wafer size 2 inch.
7 Electron Beam Lithography (EBL), RAITH 150-TWO NanoLab@TU/e Eindhoven Lithography E-beam Direct exposure of electron sensitive resists like PMMA, ZEP and HSQ Maximum wafer size 2-inch
8 Electron Beam Pattern Generator Philips Innovation Services Lithography E-beam Max. 12 inch diameter
9 Electron Beam Pattern Generator Kavli Nanolab Delft Lithography E-beam High resolution electron beam exposure Wafers 2, 3 and 4 inch Mask plates 4 and 5 inch Rectangular wafer pieces 5 x 5 … 19 x 40 mm Irregular wafer pieces Max. of 4 inch wafer
10 Ellipsometer AMOLF NanoLab Amsterdam Characterisation Ellipsometry Optical transparent thin film measurement up to wafer 100 mm
11 Ellipsometer LSE-WS Philips Innovation Services Characterisation Ellipsometry Max. 8 inch diameter
12 Ellipsometer Plasmos MESA+ NanoLab Twente Characterisation Ellipsometry Optical transparent thin film measurement Up to 100 mm
13 Ellipsometer Woollam MESA+ NanoLab Twente Characterisation Ellipsometry
14 Energy Dispersive X-Ray analysis / Wavelength dispersive X-Ray analysis (EDAX) TNO NanoLab Delft Inspection / Metrology SEM Element Analysis Max. 8 inch diameter Max. 5,5 mm thickness
15 Europlasma_MEMS EKL Nanolab Delft etching Strippers
16 Europlasma_SAL EKL Nanolab Delft etching Strippers
17 Evaporator Balzers BAK 600 MESA+ NanoLab Twente Film formation Evaporation Evaporation of metals and oxides max of 16 pieces of 100 mm
18 Evaporator DCA MESA+ NanoLab Twente Film formation Evaporation Evaporating magnetic layers Small substrate
19 Evatec Multi Cathode system Philips Innovation Services Film formation Sputtering Max. 8 inch diameter
20 Evatec Radiance-6PM Philips Innovation Services Film formation Sputtering Max. 8 inch diameter

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