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16-05-2018

The symposium on Direct Write, Optical, Ion and Electron Beam Lithography features technical experts from Heidelberg Instruments, Nanoscribe, ZEISS, micro resist technology and Raith. Experts will describe the spectrum of latest, state-of-the-art direct-write capabilities. TU Delft and Kavli Nanolab Delft make modern nanofabrication capabilities available to the community; researchers from industry and other universities are welcome.
The symposium will take place on 16 May 2018, 9 am-5 pm at Kavli NanoLab, TU Delft. Participation is free for registered participants. Please register before 1 May.

Symposium Direct Write, Optical, Ion and Electron Beam Lithography

Date: 16 May 2018 - 9 am-5 pm
Registration: Register at Raith  
Deadline for registration: 30 April 2018
Price: participation is free for registered participants
Location: Kavli NanoLab (TU Delft)
Lorentzweg 1
2628 CJ Delft - The Netherlands

 

 

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