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Equipment database NanoLabNL

Are you looking for a specific tool for lithography, thermal processing or deposition? Or do you already have a specific tool in mind and looking for a Nano Lab NL-location where you can find that tool?

Please use our equipment database to find what you are looking for. Search by:

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Process
Sub-process
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id Tool name Location Process Sub-process Function Specimen
1 4 point measurement probe own design MESA+ NanoLab Twente Characterisation 4-point probing Resistivity measurement Up to 100 mm
2 4-point prober Kavli Nanolab Delft Characterisation 4-point probing Measure sheet resistance of thin films 100 mm teflon chuck
3 7120 exposure equipment Philips Innovation Services Lithography Optical Max. 8 inch diameter
4 AFM Veeco MESA+ NanoLab Twente Inspection/Metrology AFM Surface inspection Small samples up to 100 mm
5 AFM-STM MESA+ NanoLab Twente Inspection/Metrology AFM Surface inspection Small samples up to 100 mm
6 AKT Philips Innovation Services Film formation PECVD Max. 8 inch diameter
7 ALD Philips Innovation Services Film formation PECVD 6 inch
8 Aluminium sputtercoater Oxford 400 MESA+ NanoLab Twente Film formation Sputtering Sputtering of metal layers 1-8 wafers per run (100mm)
9 AlX2000 Multi Wafer System (7wafers) Philips Innovation Services Film formation MOVPE 2, 3 and 4 inch
10 AlX200RF Single Wafer System (2x) Philips Innovation Services Film formation MOVPE max 2 inch
11 AME 5000 Philips Innovation Services Etching RIE systems 6 inch
12 Analytical TEM FEI Instruments MESA+ NanoLab Twente Characterisation TEM
13 Anisotropic silicon etching Philips Innovation Services Wet processing Inorganic processes Max. 8 inch diameter
14 Anodic bonder EVG MESA+ NanoLab Twente Miscellaneous Anodic bonding Bonding wafers Double wafer 100 mm
15 ASML Scanner NanoLab @ TU/e Eindhoven Lithography Optical Exposure of ArF DUV Resist 8-inch wafer compatible, 3-inch wafer compatibility conversion pending
16 ASML Stepper PAS5500/100 Philips Innovation Services Lithography Optical Max. 8 inch diameter
17 Atomic Force Microscope Kavli Nanolab Delft Inspection/Metrology AFM Step height measurement, roughness measurement Scanning Tunneling Microscopy (STM), Lateral Force Microscopy (LFM), Magnetic Force Microscopy (MFM, Electric Force Microscopy (EFM), Scanning Capacitance Microscopy (SCM) and Nanolithography / NanoManipulati Max. 8 inch wafer, small pieces allowed, max. thickness 2 cm.
18 Atomic Force Microscopy MESA+ NanoLab Twente Characterisation AFM Surface structure measurement Up to 100 mm
19 Atomic Force Microscopy (AFM), Bioscope Catalyst NanoLab@TU/e Eindhoven Inspection/Metrology AFM Topographic imaging and force profiling of biological samples Flat samples; size of microscope slide or cover slip.
20 Atomic layer deposition MESA+ NanoLab Twente Film formation Sputtering Deposition of very thin layers Up to 100 mm

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