Facilities for nanotechnology

Database of equipment NanoLabNL

Are you looking for a specific tool for, for example, lithography, thermal processing or deposition? Or do you already have a specific tool in mind and are you looking for a NanoLabNL-location where you can find that tool?

Please use our database (on the left side of our website) to find what you are looking for. You can search by:

• Location
• Process
• Sub-process

Can't find what you are looking for? Please contact Rens Vandeberg , program director NanoLabNL program office (STW),  or one of our representatives on location.

Basic and expert techniques

Each of the NanoLabNL locations offers a range of basic and expert techniques. The basic techniques provide a general infrastructure suitable for common nanofabrication activities with a geographical barrier as low as possible. The expert techniques are unique facilities and/or expertise you aren't likely to find anywhere else in the country.

The expert techniques of the NanoLabNL-locations are:

Kavli NanoLab Delft

High-resolution electron-beam lithography, advanced reactive plasma processing.

TNO NanoLab Delft

Contamination analysis and plasma cleaning, nano-lthography & beaminduced deposition, ultra-high precision metrology stage platform.

NanoLab@TU/e

Deposition of organic, magnetic and semiconductor nano structured materials, processing of III-V semiconductor devices

Zernike NanoLab Groningen

Soft Molecular Landing deposition

MESA+ NanoLab Twente

Nano-imprint lithography, thin film growth complex materials, ion beam etching, wide spectrum of analysis

Philips Innovation Services

• Deposition, lithography, etching, measurement, substrates of any shape up to 200 mm
• SCIL (Substrate conformal imprint lithography), e-beam lithography, double-sided processing lithography, Piezo MEMS, optical coatings, circuits on flexible substrates
• Device integration, large area microstructuring by laser ablation, microfluidics, bio-cartridges, lab-on-a-chip, LEDs and OLEDs, thin-film encapsulation
• Thin film characterization, trace analysis and contamination control, RF & DC device characterization

Please contact our representatives to discuss the possibilities for your project.

Access

Access to our facilities is arranged via NanoLabNL representatives of the participating institutions. You can find their contact information on our Contact page.

Priorities and reservations

Two categories of NanoLabNL users are distinguished:

1. Public research communities
2. Private parties and other users

In case of waiting times for NanoLabNL equipment, priorities are determined according to the following rules:

• Users from all categories have equal rights for access to facilities or equipment.
• In case of capacity limits the local head of NanoLabNL for a given institution will decide. In this case users from category 1  will get access first.
• Regulations with respect to facility use are strictly according to the local procedures (e.g. for intake, reservation of equipment, etc. ) at a given institution. Users are obliged to strictly follow the indications from the local facility responsible or deputy. Violation in this context may result in the user no longer being allowed access to the facility.

The NanolabNL parties nor the corresponding institutions will accept any responsibility for damage, directly or indirectly related to using the NanoLabNL facilities at the given institution.

Rates

We distinguish two rates* related to NanoLabNL facility use:

• Internal rate: Users from public research communities in the Netherlands**
  e.g. NanoNextNL, FOM, STW, NWO, CW, Universities, Research institutes, etc.
• External rate: Other users, private parties.
  
   Pricing level for 2012

* These rates apply to the use of the facilities of the 5 official partners of NanoLabNL and do not apply to the use of the facilities of associated partner Philips Innovation Services.

** Please note that the costs for use by researchers in the own institutions costs are paid according to the financial arrangements at that particular institution, with the internal rate as the upper limit.